Optimizing Hydrogen Plasma Etching Process of Preferred (110) Texture Diamond Film for MESFET Applic

来源 :The 8th Asian-European International Conference on Plasma Su | 被引量 : 0次 | 上传用户：wxcld

【作者】

：

Qingkai Zeng Linjun Wang Jian Huang Ke Tang Jijun Zhang Run Xu Jiahua Min Yiben Xia

【机构】

：

School of Materials Science and Engineering,Shanghai University,Shanghai 200072,China

【出处】

：

The 8th Asian-European International Conference on Plasma Su

【发表日期】

：

2011年1期

【关键词】

：

Hydrogen plasma Etching Diamond film

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Optimizing Hydrogen Plasma Etching Process of Preferred (110) Texture Diamond Film for MESFET Applic

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