【摘 要】
：
The monolayer SiNx optical thin films were prepared by Plasma Enhanced Chemical Vapor Deposition(PECVD)technique on the BK7 glass substrate,the laser-induce
【机 构】
：
Xi'anTechnologicalUniversity,China
【出 处】
：
2014年光子与光学工程国际会议暨西部光子学学术会议
论文部分内容阅读
The monolayer SiNx optical thin films were prepared by Plasma Enhanced Chemical Vapor Deposition(PECVD)technique on the BK7 glass substrate,the laser-induced damage threshold was measured by laser damage testing equipment,and we also investigated the relations between processing techniques and laser-induced damage properties.The study and analysis to orthogonal experiment results show that PECVD processing techniques havean effect on the laser-induced damage properties.Among them,the radio frequency has the biggest effection,the temperature is the main factor,the working pressure is the unimportant factor,and we also achieve the optimal processing parameters(Temperature is 350 ℃ ;RF power is 250W;Working pressure is 60Pa).
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