The capacitive coupled plasma (CCP) has been extensively used in the semiconductor industry because it has not only good uniformity,but also low electron temperature.
Low-k materials as SiO2 play important role in semiconductor industry and the plasma is one of the mostly used tools for advanced materials processing.
For optoelectronic applications such as display drive transistors or photovoltaic cells,controlling the microstructure of films is important in terms of enhancing the electrical and optical properties
Plasma etching is widely used for fabricating semiconductor electronic devices and microelectromechanical systems (MEMS),but plasma etching is known to cause damages due to charge-up and UV irradiatio
Europium (Ⅲ) and niobium (Ⅴ)-codoped TiO2 nanopowders have been synthesized by Ar/O2 radio frequency thermal plasma oxidizing atomized aqueous precursors with various concentrations of Eu3+/(Eu3++Nb5+
Dielectric barrier discharge (DBD) was widely used for generating atmospheric pressure,non-thermal plasmas and recently explored for preparing TiO2 films.
We have performed good surface passivation with intrinsic buffer layers that have different pressure on hydrogenated amorphous silicon/crystalline silicon (a-Si:H/c-Si) heterojunction solar cells by U
This article makes a research on optical fiber sensor with metal nanostructure based on the properties of optical fiber sensing technology and the optical performances of metal nanoparticles.
In the actual production of life in many cases are to consider the influence of temperature and humidity environment and precise control,Then came the data acquisition system.