Soft lithography is a low-cost and convenient method for the forming and manufacturing of micro/nanostructures compared to the traditional optical lithography. In soft lithography, poly(dimethylsiloxane)(PDMS) stamps with relief structures have been widely used to transfer patterns. The traditional fabrication approach of PDMS stamps is time-consuming since the master has been occupied during the curing process. By adding and repeating fast nanoimprint step, many intermediate polymeric molds can be produced from the master and these molds can then be employed to replicate more PDMS stamps while the time used is close to that of the common way. We demonstrated this idea by three masters which were made by the DEM (Deepetching, Electroforming and Microreplicating) and FIB (Focused Ion Beam)techniques. The photos show that the patterns on the PMDS stamps successfully duplicated patterns on the origin masters.