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用150keV的As离子大剂量注入到铌膜上,在一定条件下制备了超导膜。其超导转变温度为6.6 K。注入层的厚度约67 nm,用迭代扣普法求得了此层中的砷浓度分布,得到了Nb与As原子浓度的比值为2.2。此样品是富铌的Nb(As)超导膜,其超导转变温度比理想的Ti_3P结构的Nb_3As(Tc=0.3 K)高6.3 K。
With a 150 keV As ion dose injected into the niobium film, the superconducting film was prepared under certain conditions. Its superconducting transition temperature is 6.6 K. The thickness of the implanted layer is about 67 nm. The arsenic concentration distribution in this layer is obtained by the iterative deduction normalization method. The ratio of Nb to As concentration is 2.2. This sample is a niobium-rich Nb (As) superconducting film with a superconducting transition temperature of 6.3 K higher than that of the ideal Ti_3P structure of Nb_3As (Tc = 0.3 K).