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通过分析磁场对磁控溅射过程的影响,总结出了矩形平面直流磁控溅射装置工作区域磁场的设计原则,并给出了两种磁体结构.采用有限元方法对一套装置的磁场进行了计算,磁场计算结果与测量值吻合较好.基于上述分析计算,研究了磁场分布对靶材刻蚀形貌的影响,并进一步提出了具体的磁场改进措施.采用分流条垫补方法可以改进磁场分布,如果磁场水平分量呈马鞍形分布,靶材的利用率可以提高,采用磁极斜面结构对磁场分布的改进意义不大.另外,错开磁体间安装接缝和对永磁体精确充磁能够有效提高工作区域磁场分布的均匀性.
By analyzing the influence of the magnetic field on the magnetron sputtering process, the design principles of the magnetic field in the rectangular DC magnetron sputtering device working area are summarized, and two kinds of magnet structures are given. The magnetic field of a device is determined by the finite element method The results of calculation of magnetic field agree well with the measured values.Based on the above analysis and calculation, the influence of magnetic field distribution on the etched morphology of target is studied, and the specific measures of magnetic field improvement are also proposed.The shunt padding method can be improved Magnetic field distribution, if the horizontal component of the magnetic field is saddle-shaped distribution, the utilization of the target material can be improved, the use of magnetic pole slope structure to improve the magnetic field distribution is not significant.In addition, staggered installation of magnets between the magnets and the precise magnetization of permanent magnets can be effective Improve the uniformity of the magnetic field distribution in the work area.