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ZrO2/SiO2多层膜由相同沉积条件下的电子束蒸发方法制备而成,通过改变多层膜中高(ZrO2)、低(SiO2)折射率材料膜厚组合周期数的方法,研究了沉积在熔石英和BK7玻璃基底上多层膜中残余应力的变化.用ZYGO光学干涉仪测量了基底镀膜前后曲率半径的变化,并确定了薄膜中的残余应力.结果发现,该多层膜中的残余应力为压应力,随着薄膜中膜厚组合周期数的增加,压应力值逐渐减小.而且在相同条件下,石英基底上所沉积多层膜中的压应力值要小于BK7玻璃基底上所沉积多层膜中的压应力值.用x射线衍射技术测量分析了膜厚组合周期数不同的ZrO2/SiO2多层膜微结构,发现随着周期数增加,多层膜的结晶程度增强.同时多层膜的微结构应变表现出了与所测应力不一致的变化趋势,这主要是由多层膜中,膜层界面之间复杂的相互作用引起的.
The ZrO2 / SiO2 multilayers were prepared by the electron beam evaporation method under the same deposition conditions. By changing the number of cycles for the combination of the ZrO2 and SiO2 refractive index in the multilayers, Quartz and BK7 glass substrate on the residual stress in the multilayer film with ZYGO optical interferometer measured before and after the basement coating radius of curvature changes and to determine the residual stress in the film.The results show that the multilayer film residual stress As compressive stress, the compressive stress decreases gradually with the increase of the number of film thickness in the film, and under the same conditions, the compressive stress in the multilayer film deposited on the quartz substrate is smaller than that deposited on the BK7 glass substrate The compressive stress in multilayers was measured by X-ray diffraction technique.The microstructures of ZrO2 / SiO2 multilayers with different number of cycles were observed by X-ray diffraction and it was found that the crystallinity of multilayers increased with the increase of the number of cycles. The microstructural strain of the lamellae shows a trend of inconsistency with the measured stress, which is mainly caused by the complex interactions among the lamellae and the lamellar interfaces.