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采用溶胶_凝胶法在氧化镁单晶衬底上制备了符合化学计量比的完全填充型铁电钾钠铌酸锶钡(KNSBN)薄膜,通过X射线衍射,摇摆曲线,X射线Φ扫描,扫描电子显微镜等方法研究了薄膜的微结构,采用Adachi法研究了薄膜的电光特性.实验发现,KNSBN薄膜在氧化镁(001)单晶衬底上沿c轴外延生长,K+,Na+的引入有效地提高了薄膜的横向电光系数r51.成分为K0.2Na0.2Sr0.24Ba0.56Nb2O6,K0.2Na0.2Sr0.6Ba0.2Nb2O6,K0.2Na0.2Sr0.72Ba0.08Nb2O6的三种KNSBN薄膜的r51值分别为108.52pm/V,119.98pm/V,126.96pm/V,r51的数值随Sr2+含量增加而增大.
The stoichiometric ferroelectric potassium-stannous barium strontium baritrate (KNSBN) films were prepared on the MgO single crystal substrate by sol-gel method. The X-ray diffraction, rocking curve, X-ray Φ scan, Scanning electron microscopy (SEM) was used to investigate the microstructure of the films. The electro-optical properties of the films were investigated by Adachi method. It was found that the KNSBN films were epitaxially grown along the c-axis on a MgO (001) single crystal substrate and the introduction of K + and Na + To improve the film’s transverse electro-optic coefficient r51.The r51 values of the three KNSBN films with composition of K0.2Na0.2Sr0.24Ba0.56Nb2O6, K0.2Na0.2Sr0.6Ba0.2Nb2O6, K0.2Na0.2Sr0.72Ba0.08Nb2O6 108.52pm / V, 119.98pm / V, 126.96pm / V, the value of r51 increases with the increase of Sr2 + content.