Si掺杂Ag基超分辨薄膜读出性能研究

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超分辨薄膜是一种能够实现突破光学衍射极限的功能薄膜,它在超分辨近场光存储技术中起到至关重要的作用。采用磁控溅射共溅的方式制备了Ag掺杂一定量Si的超分辨复合薄膜,测试了其作为掩膜层的超分辨光盘读出性能,并获得了最佳的薄膜制备条件,即当Ag溅射功率为55 W,Si为95 W,溅射时间为80s,薄膜厚度为39nm时,超分辨光盘的读出信号载噪比(CNR)最高为28dB。用X射线光电子能谱测量了上述薄膜的组成,用扫描电子显微镜观察了薄膜微区形貌,并用椭圆偏振光谱仪测量了薄膜的光学常数和厚度。超分辨复合薄膜的读出机理可以用Ag的散射型机理解释。光盘在持续读出10万次以后读出信号基本没有下降。 Super-resolution film is a functional film that can achieve the breakthrough of optical diffraction limit, which plays a crucial role in super-resolution near-field optical storage technology. A super-resolution composite thin film of Ag doped with a certain amount of Si was prepared by magnetron sputter co-sputtering. The super-resolution composite thin film was tested as a mask layer, and the optimal conditions of thin film preparation were obtained. The maximum CNR of super-resolution optical disk is 28 dB when the sputtering power of Ag is 55 W, the sputtering time of Ag is 95 W, the sputtering time is 80 s and the film thickness is 39 nm. The composition of the film was measured by X-ray photoelectron spectroscopy. The morphology of the film was observed by scanning electron microscopy. The optical constant and thickness of the film were measured by ellipsometry. The mechanism of readout of super-resolution composite films can be explained by the scattering mechanism of Ag. After reading the CD continuously for 100,000 times, the readout signal basically did not drop.
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