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采用反应溅射的方法制备了一系列不同CrAlSiN层厚度的[(CrAlSiN)d/(Si3N4)0.33nm]n多层膜,并系统研究了CrAlSiN层厚度对其结构、形貌、力学性能和抗氧化行为的影响。研究表明,当CrAlSiN层厚度为3.2nm时,[(CrAlSiN)d/(Si3N4)0.33nm]n纳米多层膜具有最优异的力学性能,此时硬度高达34GPa。随后在空气气氛下用高温管式炉对[(CrAlSiN)d/(Si3N4)0.33nm]n多层膜进行氧化实验,氧化温度为700、800、900℃,保温时间2h。实验结果表明,800℃氧化处理后,多层膜仍能保持28.5GPa的硬度值,显示出优秀的抗氧化能力。
A series of [(CrAlSiN) d / (Si3N4) 0.33nm] n multilayer films with different thickness of CrAlSiN layers were prepared by reactive sputtering. The effects of thickness of CrAlSiN layers on their structure, morphology, mechanical properties and resistance Effect of Oxidation Behavior. The results show that when the thickness of CrAlSiN layer is 3.2nm, [(CrAlSiN) d / (Si3N4) 0.33nm] n nano-multilayer film has the best mechanical properties and the hardness reaches 34GPa. Subsequently, the oxidation experiment was carried out on the [(CrAlSiN) d / (Si3N4) 0.33nm] n multilayered film in a high temperature tube furnace under an air atmosphere at an oxidation temperature of 700,800 and 900 ° C for a holding time of 2 hours. The experimental results show that after 800 ℃ oxidation, the multilayer film can still maintain the hardness of 28.5GPa, showing excellent antioxidant capacity.