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  5. A direct atomic layer deposition method for growth of ultra-thin lubricant tungsten disulfide films

A direct atomic layer deposition method for growth of ultra-thin lubricant tungsten disulfide films

来源 :中国科学：技术科学英文版 | 被引量 : 0次 | 上传用户：seijxb
【摘 要】
：
我们描述一个直接原子的层免职方法种润滑剂钨二硫化物(WS <sub>2</sub>) 电影。WS <sub>2</sub> 电影在 Si (100 ) 底层和一部锌硫化物(ZnS ) 电影上被扔涂把钨 hexacarbony
【作 者】
：
SUN YongFeng CHAI ZhiMin LU Xi 
【机 构】
：
StateKeyLaboratoryofTribology,NationalEngineeringResearchCenterforNanoteehnology
【出 处】
：
中国科学：技术科学英文版
【发表日期】
：
2017年1期
【关键词】
：
钨薄膜 沉积法 原子层 超薄润滑 生长 SI(100) 二硫化 ZNS薄膜 atomic layer deposition  tungsten disulfid 
【基金项目】
：
the National Natural Science Fundation of China （Grant Nos. 50825501, 51321092 ＆ 51335005）, and the National Science and Technology Major Project （Grant No. 2008ZX02104-001）.
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论文部分内容阅读
我们描述一个直接原子的层免职方法种润滑剂钨二硫化物(WS <sub>2</sub>) 电影。WS <sub>2</sub> 电影在 Si (100 ) 底层和一部锌硫化物(ZnS ) 电影上被扔涂把钨 hexacarbonyl 和氢硫化物用作先锋的 Si (100 ) 底层。ZnS 电影用作中间的层便于 WS <sub>2</sub> 电影的成核和生长。WS <sub>2</sub> 电影的厚度经由扫描电子显微
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