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本文叙述有关锌靶和100％氧气的新反应磁控溅射工艺。由于在钟罩周围采用了一种螺线管线圈提高了平行于靶表面的漏磁力线分量。在十分高沉积速率(10微米/小时)下可在玻璃基片上制得高取向ZnO薄膜(C-轴取向)。ZnO薄膜的特性由X-射线衍射,反射电子衍射以及扫描电镜照片(SEM)确定。在0.2-0.4毛高氧压中得到了优质取向ZnO薄膜。这种溅射系统比目前其他溅射系统更为方便。
This article describes a new reactive magnetron sputtering process for zinc targets and 100% oxygen. The use of a solenoid coil around the bell increases the leakage flux component parallel to the target surface. High-orientation ZnO films (C-axis orientation) can be fabricated on glass substrates at very high deposition rates (10 microns / hour). The properties of ZnO films were determined by X-ray diffraction, reflection electron diffraction and scanning electron micrographs (SEM). High-quality oriented ZnO thin films were obtained at 0.2-0.4 wool oxygen pressure. This sputtering system is more convenient than other sputtering systems.