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利用离子束增强交替溅射聚四氟乙烯和氮化硅靶的方法制备出微组装的Teflon／Si3N4多层膜，并通过PHI-5300、FT-IR2000、XRD和AFM/FFM等测定了多层膜的结构、力学性能和微观摩擦磨损性能实验结果表明：Teflon／Si3N4多层膜由晶态的Teflon和非晶态的Si3N4组成；Teflon／Si3N4多层膜的硬度与韧性、摩擦系数与耐磨能力得到优化组合；Teflon／Si3N4膜的微摩擦力与载荷间呈良好的线形关系；当载荷大于70nN时，摩擦过程中Teflon会发生滑移，出现明显的磨损
Micro-assembled Teflon / Si3N4 multilayers were prepared by ion-beam-enhanced sputtering of polytetrafluoroethylene (PTFE) and Si3N4 targets. The multilayers of multilayers were determined by PHI-5300, FT-IR2000, XRD and AFM / The experimental results show that the Teflon / Si3N4 multilayers consist of crystalline Teflon and amorphous Si3N4. The hardness and toughness of Teflon / Si3N4 multilayers, the friction coefficient and the wear resistance Ability to be optimized combination; Teflon / Si3N4 film has a good linear relationship between the micro-friction and load; when the load is greater than 70nN, Teflon slip occurs during the friction, significant wear