提出了一种利用微纳光纤笔(MNFP)直接写入亚微米线条的技术,利用微纳光纤笔在光刻胶表面接触式扫描,从而曝光产生亚微米线条。热熔拉伸和湿法刻蚀两步工艺相结合的新方法被用来制做微纳光纤笔。实验研究表明,直写分辨率可以达到稳定的200nm线宽。这一分辨率已经突破了曝光波长(442nm)的衍射极限。结果也显示了,通过改变光强,微纳光纤笔可以直写曝光出亚微米范围内宽度可变的线条。 A technique of directly writing sub-micron lines by using micro-nano-fiber pen (MNFP) is proposed. The sub-micron lines are exposed through the contact scanning of the surface of the photoresist by using a micro-nano fiber pen. A new method combining two-stage hot melt stretching and wet etching was used to make micro-nano fiber pen. Experimental studies show that direct write resolution can reach a stable 200nm linewidth. This resolution has exceeded the diffraction limit of the exposure wavelength (442 nm). The results also show that by changing the light intensity, the micro-nano-stylus pen can be directly exposed to the width of sub-micron range of variable lines.