采用磁控溅射法在(001)、(100)及(010)LiGaO2衬底上制备了ZnO薄膜,通过X射线衍射(XRD)、原子力显微镜(AFM)、透过光谱以及光致发光谱(PL)对薄膜的结构、形貌及光学性质进行了表征。结果表明LiGaO2衬底不同晶面上制备的ZnO薄膜具有不同的择优取向,在(001)(、100)及(010)LiGaO2上分别获得了[0001][、1100]及[1120]取向的ZnO薄膜;不同取向的ZnO薄膜表面形貌差异较大;薄膜在可见光波段具有较高的透过率;在ZnO薄膜的光致发光谱中只观察到了位于378 nm的紫外发射峰,而深能级发射几乎观察不到,(1100)取向的薄膜紫外发射峰强度最大,半高宽也最小,薄膜光致发光性质的差异主要和晶粒尺寸有关。 ZnO thin films were deposited on (001), (100) and (010) LiGaO2 substrates by magnetron sputtering. The films were characterized by X-ray diffraction, atomic force microscopy (AFM), transmission spectrum and photoluminescence PL) were used to characterize the structure, morphology and optical properties of the films. The results show that ZnO films prepared on different LiGaO2 substrates have different preferential orientation. ZnO films with [0001] [1,100] and [1120] oriented ZnO have been obtained on (001), 100 and Thin films. The ZnO films with different orientations have different topography. The films have high transmittance in the visible wavelength range. Only the UV emission peak at 378 nm is observed in the photoluminescence spectra of ZnO thin films. The results show that the intensity of (1100) orientation is the highest and the FWHM is the least. The differences of the photoluminescence properties of the films are mainly related to the grain size.