卡诺公司是当代世界上首次将波长为200—260nm的远紫外光曝光技术运用于实际中去的。该公司运用远紫外曝光技术,成功地获得了最小线宽0.5mm的超微细图形。发表了能曝光5英寸片子的全自动的分离式半导体图形曝光设备“卡诺PLA——520FA”(接近式直线对准)。它是在已经发表了的“卡诺PLA——500FA”的基础上又发展了一步的新型图形曝光装置。该装置的曝光系统采用了远紫外光。它用激光和微型计算机控制,实现了光掩模和 Carnot is the first of its kind in the world that uses far-UV exposure technology with a wavelength of 200-260 nm in practice. The company used far UV exposure technology, successfully obtained the smallest line width of 0.5mm ultra-fine graphics. Published a fully automatic, discrete semiconductor pattern exposure device “Cano PLA-520FA” (Proximity Linear Alignment) capable of exposing 5-inch films. It is a new type of graphic exposure device developed on the basis of the already published “Cano PLA-500FA”. The exposure system of this device uses deep ultraviolet light. It is controlled with lasers and microcomputers, enabling photomasks and