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介绍一种离子束旋转刻蚀工艺,该工艺可用于制作真正意义上连续位相分布的衍射光学元件。对工艺系统中离子束不均匀度和基片与掩模板中心对准误差对器件性能的影响作了模拟计算,并根据对误差的模拟分析提出了工艺改进方案。
An ion beam spin-etching process is introduced, which can be used to make diffractive optical elements with true continuous phase distribution. The influence of the ion beam nonuniformity in the process system and the alignment error between the substrate and the mask center on the performance of the device was simulated and the process improvement scheme was proposed based on the simulation analysis of the error.