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采用离子束溅射法在氧化钇稳定的氧化锆(YSZ)单晶衬底上生长了RE0.5Sr0.5CoO3-δ(RE=La,Pr,Nd)薄膜。采用X射线衍射(XRD)仪和扫描电镜(SEM)测试了RE0.5Sr0.5CoO3-δ(RESCO)薄膜的微结构和表面形貌。结果表明:RE0.5Sr0.5CoO3-δ系列薄膜沿<110>方向择优生长;La0.5Sr0.5CoO3-δ(LSCO)薄膜在550℃热处理后呈现Ostwald生长,具有分散的岛状结构,在热处理温度达到750℃时岛状结构发生靠拢,同时晶粒度增大;Pr0.5Sr0.5CoO3-δ(PSCO)薄膜在750℃热处理后具有长程有序结构,呈现枝晶生长。
The RE0.5Sr0.5CoO3-δ (RE = La, Pr, Nd) thin films were grown on yttria-stabilized zirconia (YSZ) single crystal substrates by ion beam sputtering. The microstructure and surface morphology of RE0.5Sr0.5CoO3-δ (RESCO) thin films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The results show that the films of RE0.5Sr0.5CoO3-δ are preferentially grown along the <110> direction. The films of La0.5Sr0.5CoO3-δ (LSCO) show Ostwald growth after 550 ℃ heat treatment with dispersed island structure. When the temperature reaches 750 ℃, the islands close to each other and the grain size increases. Pr0.5Sr0.5CoO3-δ (PSCO) films have long-range ordered structure after heat treatment at 750 ℃, showing dendritic growth.