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本文研究了稀土元素在分子电镀中的行为,指出了异丙醇中酸浓度和水含量在电沉积过程中的作用。也研究了某些杂质和沉积层厚度对稀土元素电沉积的影响。推荐了制备稀土元素电沉积源的适宜条件,在推荐条件下沉积厚度小于500微克·厘米~(-2)时,沉积率均大于98％,沉积厚度达4.2毫克·厘米~(-2)时,沉积率仍大于60％,沉积源均匀致密,在裂变产额测定中得到了应用。
This paper studies the behavior of rare earth elements in molecular electroplating and points out the role of acid concentration and water content in isopropanol during electrodeposition. The effects of some impurities and thickness of the deposited layer on the electrodeposition of rare earth elements were also studied. The suitable conditions for preparation of rare earth element electrodeposits are recommended. When the deposition thickness is less than 500 micrograms · cm ~ (-2) under recommended conditions, the deposition rate is more than 98% and the deposition thickness is 4.2 mg · cm ~ (-2) , The deposition rate is still greater than 60%, the deposition source is uniform and compact, and has been applied in the determination of fission yield.