气体电子倍增器(GEM,Gas Electron Multiplier)是近些年发展的一种新的气体探测器,具有计数率和位置分辨率高等优点,在粒子物理和X光成像等领域有着广泛的应用前景,近些年来得到了很快的发展.该探测器发展的关键问题之一就是GEM膜结构的制造,该结构需要利用光刻等多项技术来完成,工艺复杂,研制困难.本文介绍了开发GEM膜结构的研究结果,通过干法和湿法腐蚀的研究和对比,优化出GEM膜结构制造的一种工艺过程,并利用该工艺成功完成了GEM膜结构的制造,为国内GEM气体探测器的研究和应用奠定了基础. Gas Electron Multiplier (GEM) is a new gas detector developed in recent years. It has advantages of high counting rate and position resolution, and has broad application prospect in the field of particle physics and X-ray imaging. In recent years, the rapid development has been achieved.The detector is one of the key issues in the development of GEM film structure, the structure needs to use a number of photolithography techniques to complete the complex process, the development of difficult.This article describes the development of GEM Membrane structure of the research results, through the dry and wet etching research and comparison to optimize the structure of a GEM film manufacturing process, and the use of the successful completion of the GEM film structure, as the GEM gas detector Research and application laid the foundation.