在较大冷轧变形量的情况下,研究了退火温度和退火时间对NiCr20溅射靶材再结晶晶粒大小和均匀性的影响,通过试验确定了该合金靶材900℃退火2 h得到的再结晶晶粒大小相对细小均匀,晶粒度约为68μm。在该优化的退火工艺制度下,将成品靶材坯料进行退火,取样用XRD分析其晶粒的取向,测试结果显示不同部位样品的晶粒取向分布几乎一致,说明该靶材的晶粒取向均匀。 The effect of annealing temperature and annealing time on the grain size and uniformity of recrystallization of NiCr20 sputtering target was studied under larger deformation of cold rolling. The alloy was annealed at 900 ℃ for 2 h Recrystallized grain size is relatively small and uniform, the grain size of about 68μm. In the optimized annealing process, the finished target blank was annealed and the sample was analyzed by XRD for the orientation of the crystal grains. The test results showed that the grain orientation distributions of the samples in different locations were almost the same, indicating that the crystal grains of the target were uniformly oriented .