High-Pressure Plasma Deposition of a-C:H Films by Dielectric-Barrier Discharge

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The fabrication of a-C:H films from methane has been performed using dielectric-barrier discharges at atmospheric pressure. The effect of combined-feed gas, such as carbon dioxide,carbon monoxide or acetylene on the formation of a-C:H films has been investigated. It hasbeen demonstrated that the addition of carbon monoxide or acetylene into methane leads to aremarkable improvement in the fabrication of a-C:H films. The characterization of carbon filmobtained has been conducted using FT-IR, Raman and SEM.
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