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利用电化学方法在室温下成功地沉积了类金刚石(DLC)薄膜和非晶CNx薄膜,并对制备条件进行了讨论.通过扫描电子显微镜、傅里叶变换红外光谱技术,分析了薄膜的表面形貌和化学结合状态.场发射测量结果表明:DL膜和非晶CNx的开启场分别为8·8和10V/μm;并且在23V/μm的电场下,DLC膜和非晶CNx膜的发射电流密度分别达到10和0·37mA/cm2.
DLC films and amorphous CNx films were successfully deposited by electrochemical method at room temperature, and the preparation conditions were discussed.Using scanning electron microscopy and Fourier transform infrared spectroscopy, the surface morphology The results of field emission measurements show that the turn-on fields of DL and amorphous CNx are 8 · 8 and 10 V / μm, respectively; and the emission current of DLC and amorphous CNx films is under an electric field of 23 V / μm The density reached 10 and 0 · 37mA / cm2 respectively.