论文部分内容阅读
在40°和70°斜入射条件下,用100keV Ar~+、Ne~+轰击铜靶,Ar~+所产生的溅射原子角分布的溅射优先方向分别位于表面法线的两侧,溅射原子角分布对于表面法线明显不对称;而Ne~+所对应的溅射优先方向都位于表面法线方向,且溅射原子角分布对于表面法线是对称的。用级联碰撞理论分析了所得到的实验结果,并比较了Ar~+和Ne~+溅射机制上的不同。
Under the conditions of 40 ° and 70 ° oblique incidence, the sputtering target angles of sputtering atomic angular distribution generated by Ar ~ + are located on both sides of the surface normal with 100 keV Ar ~ + and Ne ~ +, respectively. The atomic angular distribution is obviously asymmetric with respect to the surface normal, while the sputtering preferred orientation corresponding to Ne ~ + is located in the normal direction of the surface, and the atomic angular distribution of the sputtering is symmetrical with respect to the surface normal. The cascade collision theory was used to analyze the experimental results obtained and the differences in sputtering mechanism between Ar ~ + and Ne ~ + were compared.