在不同的温度下烧结制备 Ni O靶 ,用射频磁控溅射法淀积 Ni O/ Ni81 Fe1 9双层膜 ,研究了不同的温度烧结 Ni O靶对 Ni O/ Ni Fe双层膜特性的影响 ,结果表明 ,使用不同的烧结温度制备的 Ni O靶溅射所得的 Ni O膜中 Ni的化学价态及其含量不同 ,进而影响 Ni O/ Ni81 Fe1 9双层膜的磁滞回线的矩形度及层间交换耦合作用 The Ni O target was sintered at different temperatures and the Ni O / Ni81 Fe1 9 bilayer was deposited by radio frequency magnetron sputtering. The effects of different temperature sintering Ni O targets on the properties of Ni O / Ni Fe bilayers The results show that the chemical valences and contents of Ni in the Ni O films obtained by Ni O sputtering prepared by using different sintering temperature are different, and then affect the hysteresis loop of Ni O / Ni81 Fe1 9 bilayers Rectangularity and interlayer exchange coupling