为制备高质量的声表面波器件,探索金刚石薄膜的沉积工艺,采用直流电弧等离子体喷射化学气相沉积技术和特殊的复合衬底技术,在单晶硅衬底上制备了大面积、高质量的金刚石薄膜,成功解决了单晶硅衬底在沉积金刚石薄膜过程中产生的变形问题.研究了甲烷浓度和沉积温度对金刚石薄膜质量的影响,优化了沉积工艺.结果表明,甲烷气体体积分数为1.8%时,晶粒最为细小,同时金刚石薄膜的表面粗糙度最小,表面最为光滑.衬底温度为1000℃时生长的金刚石薄膜的晶粒尺寸较小. In order to prepare high-quality surface acoustic wave device, the deposition process of diamond thin film was explored. The DC arc plasma jet chemical vapor deposition and special composite substrate technology were used to fabricate large area, high quality Diamond film successfully solved the deformation problem of single crystal silicon substrate in the process of depositing diamond film.The effect of methane concentration and deposition temperature on the quality of diamond film was studied and the deposition process was optimized.The results showed that the volume fraction of methane gas was 1.8 %, The grains are the smallest, while the diamond films have the smallest surface roughness and the most smooth surface.The grain size of diamond films grown at 1000 ℃ is small.