空间光学技术的迅猛发展对空间光学系统提出了更高的要求;碳化硅材料以其优秀的物理性质,成为广泛应用的反射镜材料;碳化硅反射镜的光学加工研究也在国内外广泛开展。简要讨论了碳化硅反射镜的抛光机理;介绍了碳化硅材料抛光的实验方法;定性分析了碳化硅材料的抛光过程;通过大量的工艺实验和理论分析,讨论磨料粒度、抛光盘材料、抛光盘压力、抛光盘转速、抛光液酸碱度等工艺参数对碳化硅反射镜表面粗糙度的影响,并对各个参数加以优化,得到了优良的实验结果。 The rapid development of space optical technology puts forward higher requirements for space optical system. Silicon carbide has become a widely used reflector material due to its excellent physical properties. The research on optical processing of silicon carbide mirrors has also been widely carried out at home and abroad. The polishing mechanism of silicon carbide mirror was briefly discussed. The experimental method of silicon carbide polishing was introduced. The polishing process of silicon carbide was qualitatively analyzed. Through a large number of experiments and theoretical analysis, the effects of abrasive grain size, polishing disc material, Pressure, speed of polishing disc, acidity and alkalinity of polishing liquid on the surface roughness of silicon carbide mirror, and optimize each parameter to obtain good experimental results.