制备锕系元素靶(源)的常用方法是电镀法(又称电沉积法),它具有沉积效率高、设备简单、操作方便等优点,且可在衬底上获得均匀牢固的镀层。常用的电镀法均使用直流电源。用电镀法制备的靶镀层内应力大,易开裂,沉积厚度有限。近几年来发展了1种新型脉冲电镀制源技术。该技术采用脉 Preparation of actinides target (source) is a common method of electroplating method (also known as electrodeposition method), it has high deposition efficiency, simple equipment, easy operation, etc., and can be obtained on the substrate uniform and strong coating. Commonly used plating method are DC power supply. Plating prepared by electroplating target stress, easy to crack, deposition thickness is limited. In recent years, a new type of pulse plating system has been developed. The technology uses pulse