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利用透射电子显微镜,采用横截面电镜样品,对Ni基体磁控溅射离子镀(MSIP)A1膜的组织结构进行了分析研究。观察到了球状、柱状、块状三层次镀Al膜的组织形态,并在Ni基体和镀A1膜交界处发现了一个Al—Ni合金系中迄今未见报道的未知相,由电子衍射和透射能谱(EDX)分析其为体心四方点阵,a=b=5.88A,c=4.80A,是一富Al相。依据观察结果和离子镀技术的特点,对磁控溅射离子镀Al膜的形成机理进行了探讨。
Using transmission electron microscopy, the cross-section electron microscopy samples were used to analyze the microstructure of Ni matrix magnetron sputter ion plating (MSIP) A1 film. The microstructure of three-layer Al-coated films was observed. The unknown phase in the Al-Ni alloy was found at the interface between the Ni substrate and the Al-coated film. The electron diffraction and transmission (EDX) analysis for the body center quaternary lattice, a = b = 5.88A, c = 4.80A, is an Al-rich phase. According to the observation results and the characteristics of ion plating technology, the formation mechanism of Al film by magnetron sputter ion plating was discussed.