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日本Nissin电子公司开发出一种新的脱臭工艺，该工艺的关键是在１０００次／s的脉冲速度下产生的等离子体脉冲。该工艺可用于除去产生臭味的物质如硫化氢、氨气、甲硫醇和乙醛，比传统活性碳吸附工艺更加有效、廉价。工艺将负载的有气味物质的空气通过“等离子体脱臭”反应器，
Nissin Electronics Japan has developed a new deodorization process, the key of which is the plasma pulse generated at a pulse rate of 1000 times / s. The process can be used to remove odorous substances such as hydrogen sulfide, ammonia, methyl mercaptan and acetaldehyde than the traditional activated carbon adsorption process more effective and cheap. The process passes the loaded odorous air through a “plasma deodorization” reactor,