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综述了物理气相沉积(PVD)TiN和合金氮化物超硬膜膜/基界面及过渡层微观组织结构的研究进展,揭示了界面微观结构与镀层结合力之间的内在联系,为改善工艺及提高镀层性能提供了理论依据。
The research progress of physical vapor deposition (PVD) TiN and alloy nitride superhard film / base interface and transition layer microstructure was reviewed, and the intrinsic relationship between interface microstructure and coating adhesion was revealed. In order to improve the process and improve Coating properties provide a theoretical basis.