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针对多次曝光法制作集成衍射光学元件时存在的加工制作复杂,会引入较大的对位误差等问题,基于计算全息中的误差扩散编码原理及部分相干光成像理论,提出采用误差扩散编码方法来设计用于制作浮雕结构集成元件的编码掩模的新方法。给出了利用误差扩散法设计的色分离光栅-光束采样光栅(CSG-BSG)集成元件编码掩模,模拟计算了经部分相干成像系统后的空间像光强分布,并与理想的集成元件面形进行了比较。结果表明,校正后均方差为7.5%,体积偏差为10.2%。
The multi-exposure method for fabrication of integrated diffractive optical elements complicates fabrication and introduces a large amount of alignment errors. Based on the error diffusion coding principle in computational holography and partially coherent light imaging theory, an error diffusion encoding method is proposed To design a new method for making a coding mask for relief structure integrated components. The coding mask of color separation grating-beam sampling grating (CSG-BSG) integrated element designed by error diffusion method is given. The spatial light intensity distribution after the partially coherent imaging system is simulated and compared with the ideal integrated component surface Shapes were compared. The results showed that the corrected mean square deviation was 7.5% and the volume deviation was 10.2%.