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光谱法是测量光学薄膜光学性能的重要方法之一,能够直接表征薄膜-基底系统的光学特性,如:反射率、透过率和吸收率。通过研究薄膜-基底系统的光传输特性,推导出在基底具有弱吸收的一般条件下薄膜-基底系统反射率、透射率和吸收率的表达式,确定了通过测量单面和双面抛光基底及其薄膜特性间接获得薄膜单面光学特性的方法;在实验中使用Lambda-900分光光度计对熔融石英基底的HfO2薄膜进行了测试,并通过测量误差分析,薄膜的单面反射率误差为1.00%,单面透过率的误差为0.601%。研究结果表明文中方法可适用于各类薄膜单面特性的表征与评价。
Spectrometry is one of the important methods to measure the optical properties of optical films. It can directly characterize the optical properties of film-based systems such as reflectance, transmittance and absorptivity. By studying the light transmission characteristics of the thin film-substrate system, the expression of the reflectance, transmittance and absorption rate of the thin film-substrate system under the general condition of weak absorption of the substrate is deduced. By measuring the single and double-sided polished substrates and The film properties were indirectly obtained by the film properties. The HfO2 film on the fused silica substrate was tested by using Lambda-900 spectrophotometer in the experiment. The single-sided reflectivity error of the film was 1.00% , The error of single-sided transmittance is 0.601%. The results show that the proposed method can be applied to the characterization and evaluation of the single-sided properties of various films.