随着现代微电子技术向高集成度超微细化方向发展，不断提高制作微细图形分辨力水平，已成为光刻技术急需解决的核心问题。目前，在光刻机中，采用加入四极相干片或环形相干片实现离轴照明，提高分辨力和增大焦深，由于光路中的四极相干片或环形相干片挡掉了５０％以上的照明光 With the development of modern microelectronic technology toward highly integrated ultra-miniaturization, and continuously improving the level of making fine graphic resolution, it has become a key issue that needs to be solved urgently in lithography. At present, in the lithography machine, adopting the quadrupole coherence slice or the annular coherence slice to realize the off-axis illumination, improving the resolution and increasing the depth of focus, since the quadrupole coherence slice or the ring coherence slice in the optical path blocks out more than 50% Lighting