用等离子体浸没离子注入设备对食荚青豌种子进行了氩离子注入。卢瑟福背散射方法证实了经这种离子注入后,的确有一定数量的氩离子进入了食荚青豌种子,并发现注入种子的氩离子的相对浓度与注入的时间有关。用扫描电子显微镜对经过注入和未经注入离子的食荚青豌种子的表面形态进行了研究,发现等离子体浸没氩离子注入对种子有刻蚀作用。本文还探讨了这种注入方式引起种子细胞损伤的机制。 Argon seeds were subjected to argon ion implantation using a plasma immersion ion implantation apparatus. The Rutherford backscattering method confirms that after this ion implantation, a certain amount of argon ions do enter the green pea seeds, and the relative concentration of argon ions injected into the seeds is related to the injection time. Scanning electron microscopy (SEM) was used to study the surface morphology of the seedlings of Edible and Extruded Pea with or without ion implantation. It was found that the plasma immersion argon ion implantation had an etching effect on the seeds. This article also explores the mechanism of this injection caused seed cell damage.