A new method,called growing-etching repetitional process based on hot filament chemical vapor deposition,was proposed to improve the quality of diamond film. During the deposition carbon source was intermittently closed letting hydrogen etch the surface of the diamond film from time to time. In order to find whether it is helpful to the films quality,a series of experiments were done. The results show that the new method can enhance the orientation of the chemical vapor deposition diamond films,reduce the graphite phase and increase the films surface resistivity.