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设计了一套用于准分子激光低温多晶硅制备的线光束整形系统。系统中设置的光斑转换模块可使原始光束截面横纵倒置;利用扩束模块对原始光束的短轴进行准直,其扩束倍率可限定短轴光束尺寸,以配合短轴光束均匀模块的孔径;采用基于透镜阵列的长轴、短轴光束均匀模块可在提高光斑能量分布均匀性的同时,约束光斑尺寸;系统中设置了投影模块,可将光束投影于工件表面。为了实现系统中光学原件的精密定位,设计并加工了配套的机械调节结构;结合仿真实验,讨论了阵列单元的中心偏差及工作面的偏离对线光斑质量的影响。利用该线光束整形系统对自行研制的大能量准分子激光光源进行整形,实测的系统能量传递效率为33%,工件表面的光斑尺寸约为100mm×0.3mm,平均能量密度为470mJ·cm~(-2),长轴能量分布均匀度为93.95%,满足退火技术的要求。
A line beam shaping system for the preparation of excimer laser low temperature polycrystalline silicon was designed. In the system, the spot conversion module can make the original beam cross section to be vertical and horizontal. By using the beam expander module to collimate the minor axis of the original beam, the beam expander rate can define the minor axis beam size to match the aperture of the minor axis beam uniform module The long axis and short axis beam uniformity module based on lens array can restrain the spot size while improving the spot energy distribution uniformity. The projection module is set in the system to project the beam onto the workpiece surface. In order to realize the precise positioning of the optical components in the system, the mechanical adjustment structure is designed and processed. With the simulation experiment, the influence of the center deviation of the array element and the deviation of the working face on the quality of the line spot is discussed. The line beam shaping system is used to shape the large energy excimer laser light source. The measured system energy transfer efficiency is 33%, the spot size of the workpiece surface is about 100mm × 0.3mm and the average energy density is 470mJ · cm ~ ( -2), the energy distribution uniformity of the long axis is 93.95%, which meets the requirements of annealing technology.