运用红外技术和高斯函数对红外谱图进行分峰拟合，研究了对ＮｉＯ在ＵＳＹ分子筛、γ－Ａｌ２Ｏ３和混合载体上的对ＮＯ吸附规律，并推断出不同ＮｉＯ含量时，Ｎｉ２＋在这些载体上的分布．结果表明：位于γ－Ａｌ２Ｏ３表面、ＵＳＹ分子筛ＳⅡ、ＳⅠ位和ＳⅡ位的Ｎｉ２＋离子吸附ＮＯ时，它们的吸附频率分别为１８５５～１８７５、１９００和１９０５ｃｍ－１．ＮｉＯ在γ－Ａｌ２Ｏ３的体相和表面间存在分布平衡，约有７５％ＮｉＯ存在于γ－Ａｌ２Ｏ３体相中．在ＵＳＹ分子筛上，Ｎｉ２＋分布于分子筛ＳⅠ位的趋势远大于ＳⅡ和ＳⅡ、ＳⅠ位．增加ＮｉＯ含量将增强这种趋势．在混合载体上，Ｎｉ２＋分布于Ａｌ２Ｏ３表面的能力大于分布于分子筛的ＳⅡ和ＳⅡ、ＳⅠ位，增加ＮｉＯ量，分布于γ－Ａｌ２Ｏ３表面及ＵＳＹ分子筛ＳⅡ位的Ｎｉ２＋量显著增加，而分布于分子筛ＳⅡ、ＳⅠ位的Ｎｉ２＋量受其影响较小 The infrared spectra and the Gaussian function were used to fit the infrared spectrum. The adsorption of NO on NO on USY zeolite, γ-Al2O3 and mixed support was studied, and the NiO content was deduced on these supports Distribution. The results show that the adsorptive frequencies of Ni2 + ions adsorbed by Ni2 + ion located on the surface of γ-Al2O3, USY molecular sieve SⅡ, SⅠ and SⅡ are 1855-1875, 1900 and 1905cm-1, respectively. NiO is distributed in equilibrium between the bulk and surface of γ-Al2O3. About 75% NiO is present in the γ-Al2O3 bulk. On the USY molecular sieve, the tendency of Ni2 + distribution on the SⅠ molecular sieve is much larger than that of SⅡ, SⅡ and SⅠ. Increasing the NiO content will enhance this trend. On the mixed support, the Ni2 + distribution on the surface of Al2O3 is larger than the distribution of SⅡ and SⅡ, SⅠ on the molecular sieve, and the amount of NiO is increased. The amount of Ni2 + distributed on the surface of γ-Al2O3 and the SⅡ of USY increases significantly Molecular sieve S Ⅱ , S Ⅰ  Ni2 + position less affected