一、引言 扩散是硅平面工艺中必不可少的工艺手段,在半导体器件生产中占有非常重要的地位。随着电子工业的发展,作为掺杂剂的扩散源也得到不断改进,出现了不少新的扩散源,如固态片状BN源、固态片状磷源、硼微晶玻璃片状扩散源等等。就P型掺杂剂的硼扩散源来说,初期普遍使用硼酸三甲脂、硼酸正丙脂液态源和BN粉末源,后来逐渐为BN片状扩散源所代替。近年来,随着硼微晶玻璃片状扩散源(PWB)的出现,受到了很多用户的欢迎,实践证明,PWB源比片状BN扩散源具有更好的工艺优越性。 I. INTRODUCTION Diffusion is an indispensable technology in silicon planar process and occupies a very important position in the production of semiconductor devices. With the development of the electronics industry, the diffusion sources as dopants have also been continuously improved, and many new diffusion sources have emerged, such as solid-state sheet BN source, solid-state sheet phosphorus source, boron glass-ceramic sheet diffusion source, and the like Wait. For the boron dopant of P-type dopant, trimethyl borate, n-propyl borate liquid source and BN powder source are commonly used in the initial stage, and later BN flake diffusion sources are gradually replaced. In recent years, with the advent of boron-doped glass-ceramic flake diffusion source (PWB), it has been welcomed by many users. Practice has proved that PWB source has better process advantages than flaky BN diffusion source.