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在集成电路的生产中,已广泛采用氮化硼扩散源、新型片状氮化硼也正被推广应用,用氮化硼做扩散源,具有工艺稳定、易于掌握、扩散电阻均匀、器件结特性好等优点。我厂采用氮化硼扩散源已两年多,对稳定工艺,提高产品合格率起到了较好的效果。在实际应用中,也遇到过一些工艺问题。探讨和解决这些问题,对于进一步提高产品质量,提高合格率以及更好地推广应用氮化硼扩散源都是十分有益的。
In the production of integrated circuits, has been widely used boron nitride diffusion source, the new flake boron nitride is also being promoted, with boron nitride as a diffusion source, with a stable process, easy to grasp, diffusion resistance uniformity, device junction characteristics Good and so on. I plant boron nitride diffusion source has more than two years, the stability of the process, improve product yield has played a good effect. In practical applications, also encountered some technical problems. To explore and solve these problems is very beneficial to further improve the product quality, improve the pass rate and promote the application of boron nitride diffusion source.