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应用LAS2000辐照设备、射频离子源设备及HL1M装置对等离子体与石墨及其涂层的相互作用进行了系统研究,为进一步优化HL1M装置原位处理工艺、杂质控制以及HL2A装置第一壁的选材和第一壁处理、杂质控制等提供依据
The interaction between plasma and graphite and their coatings was studied systematically by using LAS2000 irradiation equipment, RF ion source equipment and HL1M device. In order to further optimize the in-situ treatment process, impurity control and selection of the first wall of HL2A device And the first wall treatment, impurity control to provide the basis