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双球面反射成象系统用于大规模集成电路生产中的硅片光刻和掩模复印有广阔的前景。本文提出用球形高压汞灯代替弧形汞灯作为曝光光源,设计了相应的照明系统以获得弧形照明区。对象平面的照度均匀性进行了分析和测试。本系统可用于复制3μ线宽的掩模板。
Double spherical reflex imaging system for large-scale integrated circuit production of silicon wafer lithography and mask copy has broad prospects. In this paper, spherical high-pressure mercury lamp instead of arc-shaped mercury lamp as exposure light source, designed the corresponding lighting system to obtain arc-shaped lighting area. The illuminance uniformity of the object plane was analyzed and tested. The system can be used to copy 3μ linewidth mask.