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采用对向孪生靶溅射ZnO∶A l(ZAO)薄膜可减少等离子体对基底薄膜轰击损伤,沉积速率与结晶程度高;不同气压溅射的ZAO薄膜,其透光率在波长小于700 nm时基本相同,在可见光范围内(400~700 nm),都大于80%。其中,在550 nm时的透过率大于90%;入射光大于700 nm时,ZAO较厚的薄膜对红外的吸收更多;溅射气压为2 Pa比1 Pa沉积速率低,但薄膜电子迁移率较大、电阻率低,更适合做C IS薄膜太阳电池窗口层或透明导电膜。
The sputter ZnO: Al (ZAO) thin film on the twin target can reduce the bombardment damage and deposition rate and crystallization degree of the plasma on the substrate film. The transmittance of the ZAO thin film with different pressure is less than 700 nm Basically the same, in the visible range (400 ~ 700 nm), are greater than 80%. Among them, the transmittance at 550 nm is more than 90%. When the incident light is greater than 700 nm, the thicker ZAO film absorbs more infrared light. The sputtering pressure is 2 Pa, which is lower than 1 Pa, but the film electron transfer Larger rate, low resistivity, more suitable for C IS thin film solar cell window layer or transparent conductive film.