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通过单掩模紫外(UV)光刻、感应耦合等离子体(ICP)刻蚀及KOH∶H2O化学腐蚀,在硅片上制作5×5元面阵硅折射微光学结构.通过电化学方法将制成的硅精细图形结构转换成镍版,进而通过压制法将精细的镍版图形进一步转印到有机玻璃材料上,从而制成面阵光学波前出射结构.光刻版由结构尺寸在微米量级的大量微孔组成,其特征尺度和排布方式由算法生成.微形貌测试显示了制作的折射微光学波前出射结构具有预期的表面形貌特征.通过常规光学测试,比较和分析了出射复杂波前的情况.
A 5 × 5 element area arrayed silicon refractive micro-optical structure was fabricated on silicon by single-mask ultraviolet (UV) lithography, inductively coupled plasma (ICP) etching and KOH: H2O chemical etching. Silicon into a fine graphic structure into a nickel version, and then pressed by fine nickel plate will be further transferred to the plexiglass material on the material, so as to make an array of optical front-end wave structure. Lithography from the structure size in microns Level micropores, and its characteristic dimensions and arrangement are generated by the algorithm.Microscopic morphology test shows that the refractive micro-optical wavefront exit structure has the expected surface topography characteristics.Compared and analyzed by conventional optical tests Exiting a complex wavefront situation.