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提出一个软Ｘ射线投影光刻、缩比为６１、由两非球面镜构成的光学系统。该系统在波长为１３ｎｍ时，可获得３０ｍｍ的平像场和优于０．１μｍ的光刻线条分辨率，其最大畸变为０．４％。
A soft X-ray projection lithography was proposed with an optical system consisting of two aspherical mirrors with a reduction ratio of 61. The system achieves a flat field of 30 mm and resolution of lithographic lines superior to 0.1 μm at a wavelength of 13 nm with a maximum distortion of 0.4%.