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以电沉积方法制备了非晶态Ni-S合金,用差示扫描量热(DSC)和X-射线衍射(XRD)方法对非晶态Ni-S合金的晶化温度、晶化过程和晶体结构的转化等行为进行了研究。结果表明:镀层在380K有少量Ni发生晶化,在440K发生3Ni+2S生成Ni3S2的反应和大量Ni的结晶;最终在镀层中形成了热稳定性较高的Ni+Ni3S2混晶结构
The amorphous Ni-S alloys were prepared by electrodeposition. The crystallization temperature, crystallization process and crystallization of amorphous Ni-S alloy were characterized by differential scanning calorimetry (DSC) and X-ray diffraction (XRD) Structural transformation and other behaviors were studied. The results show that a small amount of Ni crystallizes at 380K and a 3Ni + 2S Ni3S2 reaction occurs at 440K and a large amount of Ni crystallizes. Finally, a Ni + Ni3S2 mixed crystal structure with high thermal stability is formed in the coating