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采用Kaufman离子源刻蚀微透镜列阵并采用实时检测系统对刻蚀深度进行了控制。提出了测量微透镜列阵衍射效率的一种方法。对测量误差进行了讨论。
The Kaufman ion source was used to etch the microlens array and the depth of etching was controlled using a real-time inspection system. A method of measuring the diffraction efficiency of microlens arrays is proposed. The measurement error is discussed.