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深刻蚀高密度熔融石英光栅是一种新型高效的衍射光学元件,具有衍射效率高、成本低、抗损伤,能在高强度激光条件下工作等优点。给出了利用感应耦合等离子体(ICP)技术制作熔融石英深刻蚀光栅的详细过程,并在一定的优化条件下制作了一系列不同周期、开口比和深度的高质量深刻蚀石英光栅。实验得到的最大刻蚀深度为4μm,并且在600 l/mm的高密度条件下得到了刻蚀深度为1.9μm的高深宽比石英光栅。光栅侧壁陡直,表面平整,没有聚合物沉积。所制作的熔融石英光栅元件在高强激光环境、光谱仪、高效滤波器和波分复用系统等领域中有非常广泛的用途。
Deep Erosion High-density fused silica grating is a new type of highly efficient diffractive optical element with the advantages of high diffraction efficiency, low cost, anti-damage and working under high-intensity laser conditions. The detailed process of making deep etching of fused silica by inductively coupled plasma (ICP) was given. A series of high quality deep etched quartz gratings with different periods, aperture ratio and depth were fabricated under certain optimized conditions. The experimental maximum etching depth is 4μm, and a high aspect ratio quartz grating with an etching depth of 1.9μm is obtained under a high density of 600 l / mm. Raster steep, smooth surface, no polymer deposition. The fabricated fused silica grating has a very wide range of uses in the fields of high-intensity laser environments, spectrometers, high-efficiency filters and wavelength-division multiplexing systems.