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利用电感耦合等离子体(ICP)装置对分子束外延(MBE)法在Sapphire衬底上生长的Zn1-xMgxO薄膜的Mg组分进行了测试.经理论分析,得到使用1次和2次检量式所确定的Zn1-xMgxO薄膜中的Mg组分的差异.将采用1次检量式的ICP测定与EPMA测定结果进行对照,表明当Mg组分x≤0·5时二者的测试结果相当一致,由此证明ICP测试结果的正确性.
The Mg composition of Zn1-xMgxO thin films grown by the molecular beam epitaxy (MBE) method on Sapphire substrates was tested by Inductively Coupled Plasma (ICP) .After theoretical analysis, The differences of the Mg components in the determined Zn1-xMgxO films are compared with those of the EPMA measurement by a single-pass ICP test, which shows that the test results of both are quite consistent when the Mg content is less than or equal to 0.5 , Which proves the correctness of ICP test results.