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用扫描电子显微镜观察了电弧离子镀中各种不同偏压模式 :不加偏压、加不同直流偏压和加幅值相同但占空比不同的脉冲偏压情况下获得的 Ti N薄膜的表面形貌。结果表明 ,脉冲偏压可以大大减小膜表面的大颗粒尺寸和数量 ,显著改善表面形貌。
Scanning electron microscope (SEM) was used to observe the different bias modes in arc ion plating. The surface of the TiN thin film obtained under the bias conditions of no bias, different DC bias and the same amplitude but different duty cycles Topography The results show that the pulsed bias can greatly reduce the size and number of large particles on the surface of the membrane and significantly improve the surface morphology.